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Comparison of C2F6 and FASi-4 as fluorine dopant sources in plasma enhanced chemical vapor deposited fluorinated silica glass films
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- Journal:
- Journal of Materials Research / Volume 12 / Issue 1 / January 1997
- Published online by Cambridge University Press:
- 31 January 2011, pp. 70-74
- Print publication:
- January 1997
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- Article
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