5 results
The Chemical Vapor Deposition of Al-Cu Films Utilizing Independent Aluminum and Copper Organometallic Sources in a Simultaneous Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 289
- Print publication:
- 1996
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Surface and Reactor Effects on Selective Copper Deposition from Cu(hfac)tmvs
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- Journal:
- MRS Online Proceedings Library Archive / Volume 282 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 347
- Print publication:
- 1992
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The Deposition of Borophosphosilicate Glass Films by LPCVD Using 2,4,6,8 Tetramethylcyclotetrasiloxane
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- Journal:
- MRS Online Proceedings Library Archive / Volume 204 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 533
- Print publication:
- 1990
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The LPCVD of Silicon Nitride Films from Alkylazidosilanes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 204 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 515
- Print publication:
- 1990
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Diethylsilane as a Silicon Source for the Deposition of Silicon Nitride and Silicon Oxynitride Films by LPCVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 204 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 509
- Print publication:
- 1990
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