Symposium E – Low Energy Ion Beam and Plasma Modification of Materials
Research Article
Study of the Orientation of Y1Ba2cu/3O7−x Thin Films In-Situ Prepared by Reactive Coevaporation With RF Activated Oxygen-Ozone Plasma.
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- 16 February 2011, 153
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Preparation of Optically Smooth Surfaces of High TcSuperconducting Films
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- 16 February 2011, 159
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Plasma Oxidation of Y-Ba-Cu-O Precursor Filaments
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- 16 February 2011, 165
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Energy Distribution of Negative Oxygen Ions Emitted from YBaCuO and Iron Garnet Targets by dc- and rf-Magnetron Sputtering
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- 16 February 2011, 171
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GaAs Epitaxial Growth by ECR-MBE
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- 16 February 2011, 179
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CH4 :H2 :Ar rf/ECR Plasma Etching of GaAs and InP
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- 16 February 2011, 191
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Structural And Compositional Modifications of III–V Ternary and Quaternary Compounds Induced by Ion Bombardment
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- 16 February 2011, 197
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Persistent Photoconductivity And Thermal Recovery Kinetics Of Low Energy Ar + Bombarded GaAs
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- 16 February 2011, 203
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Electrical Damage Due to Low Energy Plasma Processing of GaAs Structures
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- 16 February 2011, 209
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Chemical Precursors for GaAs Etching with low Energy ion Beams: Chlorine adsorption on GaAs(100)
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- 16 February 2011, 215
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Heteroepitaxy of Si/Si1−xGex Grown by Remote Plasma-Enhanced Chemical Vapor Deposition
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- 16 February 2011, 223
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Evidence of Oscillating Oxide Growth Mechanism during Oxygen Plasma Oxidation of Silicon
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- 16 February 2011, 229
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Room Temperature Nitridation and Oxidation of Si, Ge and Mbegrown Sige Using Low Energy Ion Beams (0.1-1 Kev).
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- 16 February 2011, 235
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Atomic Hydrogen Passivation of High Energy Hydrogen Implants
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- 16 February 2011, 241
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The Role of Oxygen In the CF2Cl2 Reactive Ion Etching of Pecvd Films
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- 16 February 2011, 249
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The Influence of HBr Discharge Ambience on Poly-Si/SiO2 Etching Selectivity
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- 16 February 2011, 255
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Ion Effects in Optical Films
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- 16 February 2011, 263
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Ion Beam Sputter Deposition Of Ferroelectric Oxide Thin Films
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- 16 February 2011, 273
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Preparation Of Bi4Ti3O12 Films by ECR Plasma SpuTtering
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- 16 February 2011, 283
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Deposition Of Aluminium Nitride Film By Ion Beam Enhanced Reactive Magnetron Sputtering
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- 16 February 2011, 289
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