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Refractive Index Profiles of High Dose Ti Implanted Optical Waveguides in LiNbO3

Published online by Cambridge University Press:  25 February 2011

T. Bremer ,
P.R. Ashley ,
R. Irmscher  and
Ch. Buchal
T. Bremer
Affiliation:
University of Osnabrück, D-4500 Osnabrück, FRG
P.R. Ashley
Affiliation:
Research Directorate, USAML Redstone Arsenal, AL 35898
R. Irmscher
Affiliation:
Inst. Schicht- und Ionentechnik, KFA, D-5170 Jülich, FRG
Ch. Buchal
Affiliation:
Inst. Schicht- und Ionentechnik, KFA, D-5170 Jülich, FRG
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Abstract

Single crystalline substrates of LiNb03 have been implanted with 48Ti ions at 200 keV and doses up to 4 × 1017 cm−2. The implants have been performed at wafer temperatures of 77 K, 300 K and 620 K. Immediate subsequent processing at 1273 K in wet oxygen ambient led to good epitaxial regrowth at all doses, if sufficient time was allowed. The maximum observed extraordinary refractive index change after regrowth Δne=0.04, indicating a solubility limit of 3.3×l021 Ti cm−3 corresponding to 18 % of Nb5+ replaced by Ti4+.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 525
Copyright
Copyright © Materials Research Society 1990

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References

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