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Properties of Mbe Grown Heterostructures of GaAs/InSb and InP/InSb.

Published online by Cambridge University Press:  28 February 2011

M. T. Asom
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
E. A. Fitzgerald
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
F. A. Thiel
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
R. People
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
D. Eaglesham
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
L. Luther
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
S. K. Sputz
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
L.C. Kimerling
Affiliation:
AT&T Bell laboratories, Murray Hill NJ 07974
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Abstract

We have employed molecular beam epitaxy in the growth of InSb on GaAs and InP. The transport, optical and structural properties of the films were investigated by in-situ reflection high energy electron diffraction, Hall effect and temperature dependent Hall effect, photoluminescence, transmission electron microscopy and X-ray diffractometry techniques. We report mobilities of up to 32,000 cm2/volt-sec and free electron concentrations of 3x1016/cm3 at room temperature. We have discovered a new defect state in InSb with an energy position of Ec - 0.05 ± 0.006eV. Optical and structural measurements reveal that the differences in thermal expansion and lattice mismatch between the substrates and films results in the broadening of the X-ray diffraction peaks and the near gap photoluminescence linewidths. Furthermore, we observe band gap shifts to higher energies of 10meV and 20meV for growth on GaAs and InP, respectively.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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