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New Particle Metrology for CMP Slurries

Published online by Cambridge University Press:  01 February 2011

Kim Williams ,
Ilyong Park ,
Edward E. Remsen  and
Mansour Moinpour
Kim Williams
Affiliation:
[email protected], ., ., ., ., FL, ., United States
Ilyong Park
Affiliation:
[email protected], Colorado School of Mines, Chemistry and Geochemistry, 1500 Illinois St., Golden, CO, 80401, United States
Edward E. Remsen
Affiliation:
[email protected], Cabot Microelectronics Corporation, 870 North Commons Drive, Aurora, IL, 60504, United States
Mansour Moinpour
Affiliation:
[email protected], Intel Corporation, 2200 Mission College Blvd., Santa Clara, CA, 95054, United States
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Abstract

A new particle sizing and counting method based on the coupling of flow field-flow fractionation (FFF) with dual-sensor, single particle optical sensing (SPOS) detection is reported. The integration of FFF and SPOS systems was accomplished by means of a dilution interface that preserved the resolution of FFF-separated particles. Analysis of a model mixture of polystyrene latex standards of different diameters established that the FFF-SPOS system can resolve particles into discrete peaks for subsequent particle counting. Application of this method for the analysis of a colloidal silica standard demonstrated its use for materials commonly employed as CMP abrasives. Further development and refinement of the technique will enable compositional and structural analyses of heterogeneous large particle populations constituting commercial CMP slurries.

Keywords

CMPoptical propertiesparticulate
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 991: Symposium C – Advances and Challenges in Chemical Mechanical Planarization , 2007 , 0991-C09-01
Copyright
Copyright © Materials Research Society 2007

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References

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