Hostname: page-component-7479d7b7d-c9gpj Total loading time: 0 Render date: 2024-07-15T13:52:20.675Z Has data issue: false hasContentIssue false

Infrared Electroabsorption Spectra in Amorphous Silicon Solar Cells

Published online by Cambridge University Press:  15 February 2011

J. H. Lyou
Affiliation:
Department of Physics, Syracuse University, Syracuse, NY 13244-1130
Eric A. Schiff
Affiliation:
Department of Physics, Syracuse University, Syracuse, NY 13244-1130
Steven S. Hegedus
Affiliation:
Institute of Energy Conversion, University of Delaware, Newark, DE 19716-3820
S. Guha
Affiliation:
United Solar Systems Corporation, Troy, Michigan 48084
J. Yang
Affiliation:
United Solar Systems Corporation, Troy, Michigan 48084
Get access

Abstract

We report measurements of the infrared spectrum detected by modulating the reverse-bias voltage across amorphous silicon pin solar cells and Schottky barrier diodes. We find a band with a peak energy of 0.8 eV. The existence of this band has not, to our knowledge, been reported previously. The strength of the infrared band depends linearly upon applied bias, as opposed to the quadratic dependence for interband electroabsorption in amorphous silicon.

The band's peak energy agrees fairly well with the known optical transition energies for dangling bond defects, but the linear dependence on bias and the magnitude of the signal are surprising if interpreted using an analogy to interband electroabsorption. A model based on absorption by defects near the n/i interface of the diodes accounts well for the infrared spectrum.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Jalali, S. Al and Weiser, G., J. Non-Crystalline Solids 41, 1 (1980); G. Weiser, U. Dersch, and P. Thomas, Phil. Mag. B 57, 721 (1988).Google Scholar
2. Okamoto, H., Hattori, K., and Hamakawa, Y., J. Non-Cryst. Solids 137&138, 627 (1991) and 164-166, 893 (1993).Google Scholar
3. Jiang, L., Wang, Q., Schiff, E. A., Guha, S., and Yang, J., Appl. Phys. Lett. 72, 1060 (1998).Google Scholar
4. Eggert, J. R. and Paul, W., Phys. Rev. B 35, 7993 (1987).Google Scholar
5. Chen, L., Tauc, J., Lee, J.-K., and Schiff, E. A., Phys. Rev. B 43, 11694 (1991) and references therein.Google Scholar
6. Wang, Q., Schiff, E. A., and Hegedus, S. S., in Amorphous Silicon Technology-1994, edited by Schiff, E. A., Hack, M., Madan, A., Powell, M., and Matsuda, A (Materials Research Society, Pittsburgh, 1994), Vol. 336, p. 365.Google Scholar
7. Jiang, Lin, Wang, Qi, Schiff, E. A., Guha, S., Yang, J., Deng, Xunming, Appl. Phys. Lett. 69, 3063 (1996).Google Scholar
8. Street, R. A., Hydrogenated Amorphous Silicon (Cambridge University Press, Cambridge, 1991), p. 130.Google Scholar