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Controlling The Lateral Photoeffect In a-Si:H Heterojunction Structures: The Influence of The Band Offset Analysed Through A Numerical Simulation

Published online by Cambridge University Press:  17 March 2011

M. Fernandes
Affiliation:
ISEL-DEEC, Rua Conselhero Navarro, 1900 Lisbon, Portugal
P. Louro
Affiliation:
ISEL-DEEC, Rua Conselhero Navarro, 1900 Lisbon, Portugal
R. Schwarz
Affiliation:
ISEL-DEEC, Rua Conselhero Navarro, 1900 Lisbon, Portugal
M. Vieira
Affiliation:
ISEL-DEEC, Rua Conselhero Navarro, 1900 Lisbon, Portugal
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Abstract

When an a-Si:H p-i-n structure is locally illuminated by a light spot, the non uniformity of light causes the appearance of a gradient in the carrier concentration between the illuminated and the dark zone. Carrier start to flow in agreement with such gradients, and when equilibrium is reached, the lateral diffusion process is counterbalanced by the appearance of a lateral component of the electric field vector in addition to the transverse usual one. The lateral fields act as a gate for the lateral flow of the carriers and small lateral currents appears at the transition region between the illuminated and the dark zone.

Such lateral photoeffect depends on the incident light wavelength, light intensity and on the device operation condition (mainly the applied bias). The introduction of carbon in the doped layers modifies the intensity and the extension of these lateral effects through the potential barriers deriving from the band banding at the interfaces.

We have used the 2D numerical simulator ASCA to analyze the behavior of an a-Si:H p-i-n structure under local illumination with the goal of observing the appearance of the lateral components of the electric field and current density vectors. Different homo and heterojunctions have been simulated, outlining how the band offset at the interfaces influences the induced lateral photoeffect and aiming to explain how a correct device design and engineering can, depending on the foreseen application, alternatively enhance or reduce the intensity of such lateral effects.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

[1] Schottky, W., Physik Zeitung, Vol. 31, p. 913 (1930).Google Scholar
[2] Wallmark, J. Torkel, Proceedings of the IRE, Vol. 43, p. 474 (1956).Google Scholar
[3] Luckovsky, G., Journal of Applied Physics, Vol. 31, p. 1088 (1960).10.1063/1.1735750Google Scholar
[4] Emmons, R. B., Solid State Electronics, Vol. 10, p. 505 (1967).Google Scholar
[5] Connors, W. P., IEEE Transaction on Electron Devices, Vol. ED–18, p. 591 (1971).Google Scholar
[6] Woltring, H. J., IEEE Transaction on Electron Devices, Vol. 8, p. 581 (1975).10.1109/T-ED.1975.18181Google Scholar
[7] Chen, I., Journal of Applied Physics, Vol. 64, p. 2224 (1988).Google Scholar
[8] Fortunato, E., Vieira, M., Ferreira, L., Carvalho, C. N., Lavareda, G. and Martins, R., Materials Research Society, 297 (1993) p. 981.Google Scholar
[9] Appl. Phys. Lett. 70 (1997) 220.Google Scholar
[10] Martins, R., Vieira, M., Fortunato, E., Ferreira, I., Soares, F. and Guimarães, L.. MRS Symp. Amorphous Silicon Technology, Vol. 192, pp. 169174 (1990).Google Scholar
[11] Fantoni, A., Vieira, M. Cruz, J., Schwarz, R., Martins, R., Journal of Physics D: Applied Physics, Vol. 29, p. 3154 (1996).Google Scholar
[12] Vieira, M., Fernandes, M., Martins, J., Louro, P., Maçarico, A., Schwarz, R., and Schubert, M., Accepted for publication in Inaugural Edition of IEEE Sensors Journal (June 2001)Google Scholar
[13] Fantoni, A., Vieira, M., Martins, R., Mathematics and Computers in Simulation, Vol. 49. pp. 381401 (1999)Google Scholar
[14] Fantoni, A., “Modelling and Simulation of Hydrogenated Amorphous and Microcrystalline Silicon Optoelectronic Devices”, PhD Thesis, New University of Lisbon, Lisbon, Portugal (1999)Google Scholar
[15] Lundstrom, M. S., Shuelke, R. J., IEEE Transaction on Electron Devices, Vol. ED–30, p. 1151 (1983).10.1109/T-ED.1983.21271Google Scholar
[16] Marshak, A. H. and Vliet, M. van, Solid State Electronics, Vol. 21, p. 417 (1978).Google Scholar