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Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition

Published online by Cambridge University Press:  11 July 2012

Masaharu Shiratani ,
Kosuke Hatozaki ,
Yuji Hashimoto ,
Yeonwon Kim ,
Hyunwoong Seo ,
Kunihiro Kamataki ,
Giichiro Uchida ,
Naho Itagaki  and
Kazunori Koga
Masaharu Shiratani
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kosuke Hatozaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Yuji Hashimoto
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Yeonwon Kim
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Hyunwoong Seo
Affiliation:
Center of Plasma Nano-interface Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kunihiro Kamataki
Affiliation:
Faculty of Arts and Science, Kyushu University, 744 Motooka, Fukuoka, 819-0395, Japan
Giichiro Uchida
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Naho Itagaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kazunori Koga
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
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Abstract

We have developed a cluster-eliminating filter which reduces amount of amorphous silicon nanoparticles (clusters) incorporated into a-Si:H films. We have applied the filter to fabricate a-Si:H Schottky solar cells. The cells show a high initial fill factor FF=0.563 and a high stabilized value after light soaking FF=0.552 which light-induced degradation was quite low value of 1.95 %.

Keywords

amorphousphotovoltaicplasma-enhanced CVD (PECVD) (deposition)
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1426: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology—2012 , 2012 , pp. 377 - 382
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

Meier, J., Dubail, S., Fluckiger, R., Keppner, H., and Shah, A., Proc. IEEE 1st World Conference on Photovoltaic Energy Conversion, 409 (1994).Google Scholar
Meier, J., Torres, P., Platz, R., Dubail, S., Kroll, U., Selvan, J.A.A., Vaucher, N.P., Hof, C., Fischer, D., Keppner, H., and Shah, A., Mater. Res. Soc. Symp. Proc. 420, 3 (1996).CrossRefGoogle Scholar
Meier, J., Dubail, S., Cuperus, J., Kroll, U., Plats, R., Torres, P., Selvan, J. A., Pernet, P., Beck, N., Pellaton Vaucher, N., Hof, Ch., Fischer, D., Keppner, H., and Shah, A., J. Non-Cryst. Solids 227, 1250 (1998).CrossRefGoogle Scholar
Keppner, H., Meier, J., Torres, P., Fischer, D., and Shah, A., Appl. Phys. A 69, 169 (1999).CrossRefGoogle Scholar
Yamamoto, K., Yoshimi, M., Tawada, Y., Okamoto, Y., and Nakajima, A., J. Non-Cryst. Solids 266, 1082 (2000).CrossRefGoogle Scholar
Zeman, M., J. Electr. Eng. 61, 71 (2010).Google Scholar
Konagai, M., Jpn. J. Appl. Phys. 50, 030001 (2011).CrossRefGoogle Scholar
Matsui, T., Sai, H., Saito, K., Kondo, M., 21st International Photovoltaic Science and Engineering Conference 4A-2O-03 (2011).Google Scholar
Matsuda, A., Jpn. J. Appl. Phys. 43, 7909 (2004).CrossRefGoogle Scholar
Schropp, R. E. I., Zeman, M., “Amorphous and Microcrystalline Silicon Solar Cells” (Kluwer Academic Publishers, 1998) pp. 47, 99.Google Scholar
Sonobe, H., Sato, A., Shimizu, S., Matsui, T., Kondo, M., Matsuda, A., Thin Solid Films 502, 306 (2006).CrossRefGoogle Scholar
Kondo, M., Matsuda, A., Thin Solid Films 457, 97 (2004).CrossRefGoogle Scholar
Nishimoto, T., Takai, M., Miyahara, H., Kondo, M., Matsuda, A., J. Non-Cryst. Solids 299, 1116 (2002).CrossRefGoogle Scholar
Staebler, D.L. and Wronski, C.R., Appl. Phys. Lett. 31, 292 (1977).CrossRefGoogle Scholar
Zeman, M., van Elzakker, G., Sutta, P., Isabella, O., and Krc, J., J. Microelectronic Components and Mater. 39, 223 (2009).Google Scholar
Chowdhury, A., Mukhopadhyay, S., and Ray, S., Sol. Energ. Mater. Sol. C. 93, 597 (2009).CrossRefGoogle Scholar
Stradins, P., Proc. 35th IEEE Photovoltaic Specialists Conference, 142 (2010).Google Scholar
Inoue, H., Tanaka, K., Sano, Y., Nishimura, T., Teramoto, A., Hirayama, M., and Ohmi, T., Jpn. J. Appl. Phys. 50, 0365502 (2011).CrossRefGoogle Scholar
Koga, K., Matsuoka, Y., Tanaka, K., Shiratani, M., Watanabe, Y., Appl. Phys. Lett. 77, 196 (2000).CrossRefGoogle Scholar
Watanabe, Y., Harikai, A., Koga, K., and Shiratani, M., Pure Appl. Chem. 74, 483 (2002).CrossRefGoogle Scholar
Matsuda, A., J. Plasma Fusion Res. 76, 760 (2000).Google Scholar
Shiratani, M., Koga, K., J. Plasma Fusion Res. 86, 33 (2010).Google Scholar
Wang, N., Dalal, VL., J. Non-Cryst. Solids. 352.1937 (2006).CrossRefGoogle Scholar
Shimizu, S., Matsuda, A., Kondo, M.. J. Sol. Energy Mater. Sol. Cells. 92.1241(2008).CrossRefGoogle Scholar
Koga, K., Inoue, T., Bando, K., Iwashita, S., Shiratani, M., and Watanabe, Y., Jpn. J. Appl. Phys. 44, L1430 (2005).CrossRefGoogle Scholar
Strahm, B., Hollenstein, Ch., J. Appl. Phys. 107, 023302 (2010).CrossRefGoogle Scholar
Nakamura, W.M., Matsuzaki, H., Sato, H., Kawashima, Y., Koga, K., and Shiratani, M., Surface and Coating Technologies 205, S241 (2010).CrossRefGoogle Scholar
Koga, K., Kaguchi, N., Shiratani, M., and Watanabe, Y., J. Vac. Sci. Technol. A. 22, 1536 (2004).CrossRefGoogle Scholar
Koga, K., Kaguchi, N., Bando, K., Shiratani, M., and Watanabe, Y., Rev. Sci., Instrum. 76, 113501 (2005).CrossRefGoogle Scholar
Gallagher, A., J. Appl. Phys. 60, 1369 (1986).CrossRefGoogle Scholar
Sato, H., Kawashima, Y., Tanaka, M., Koga, K., Nakamura, W.M., and Shiratani, M., J. Plasma Fusion Res. SERIES 8, 1435 (2009).Google Scholar
Koga, K., Inoue, T., Bando, K., Iwashita, S., Shiratani, M. and Watanabe, Y., Jpn. J.Appl. Phys. 44, L1430 (2005).CrossRefGoogle Scholar
Koga, K., Iwabeppu, K., Kai, M., Harikai, A., Shiratani, M., and Watanabe, Y., International Workshop on Information & Electrical Engineering 238 (2002).Google Scholar