Hostname: page-component-586b7cd67f-rcrh6 Total loading time: 0 Render date: 2024-11-29T09:18:11.255Z Has data issue: false hasContentIssue false

Properties of Magneto-Optical Co-Pt and Magnetoresistive Co-Cu Alloy Films

Published online by Cambridge University Press:  15 February 2011

Y. P. Lee
Affiliation:
Sunmoon University, Asan, Choongnam, Korea
K. W. Kim
Affiliation:
Sunmoon University, Asan, Choongnam, Korea
G. M. Lee
Affiliation:
Sunmoon University, Asan, Choongnam, Korea
Y. V. Kudryavtsev
Affiliation:
Sunmoon University, Asan, Choongnam, Korea
G. S. Chang
Affiliation:
Yonsei University, Seoul, Korea
C. N. Whang
Affiliation:
Yonsei University, Seoul, Korea
Get access

Abstract

Co-Cu films of 1000 – 1500 Å thick were produced by means of flash-evaporation technique at 150 K, 400 K, 520 K and 720 K. The Co022Cu078 films produced at 400 K or 520 K exhibit the maximum value of MR of 16.5% at 77 K and 1.5 T. Co-Pt films of 200 Å thick with Pt buffer layers of 200 Å thick were prepared at room temperature (RT) by ultrahigh-vacuum cosputtering. The saturation polar Kerr rotation angles (θk) at RT of CoPt3 film are all larger than those of the Co/Pt multilayered (ML) film of the corresponding composition. The surface morphology, mean grain and magnetic domain sizes, and size distributions of the grains and magnetic domains of the Co alloy films have been investigated by magnetic force microscopy (MFM) and atomic force microscopy (AFM). The results were correlated with those obtained by using MO and optical spectroscopy at both RT and low temperatures (LT) in a spectral ramge of 0.5 – 4.4 eV, and magnetic investigations at both RT and LT including field-dependence measurement of MR. The overall results reflect the changes in the electronic structures and magnetic states of the constituent elements, induced by the structural transformation or correlated with the structures of the films.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Carcia, P. F., Meinhaldt, A. D., and Suna, A., Appl. Phys. Lett. 47, 178 (1985).Google Scholar
2. Hashimoto, S., Ochiai, Y., and Aso, K., J. Appl. Phys. 67, 2136 (1990).Google Scholar
3. den Broeder, F. J. A. et al, J. Appl. Phys. 61, 4317 (1987).Google Scholar
4. Zeper, W. B. et al., J. Appl. Phys. 65, 4971 (1989).Google Scholar
5. Tsunashima, S. et al., J. Magn. Magn. Mater. 93, 465 (1991).Google Scholar
6. Lin, C. J. et al., J. Magn. Magn. Mater. 93, 194 (1991).Google Scholar
7. Lin, C. J. and Gorman, G. L., Appl. Phys. Lett. 61, 600 (1992).Google Scholar
8. Weller, D., Brandie, H., and Chappert, C., J. Magn. Magn. Mater. 121, 461 (1993).Google Scholar
9. Huang, T. C. et al., Appl. Phys. Lett. 62, 1353 (1993).Google Scholar
10. Galeotti, M. et al., Surf. Sci. 297, 202 (1993).Google Scholar
11. Farrow, R. F. C et al, Mat. Res. Soc. Symp. Proc. 343, 375 (1994).Google Scholar
12. Berkowitz, A. E. et al., Appl. Phys. 73, 5320 (1993).Google Scholar
13. Xiao, J. Q., Jiang, J. S., and Chien, C. L., Phys. Rev. B 46, 9266 (1992).Google Scholar
14. Xiao, J. Q., Wang, J. Q., and Xiong, P., Appl. Phys. Lett. 62, 420 (1993).Google Scholar
15. Lee, Y. P. et al., J. Appl. Phys. (submitted).Google Scholar
16. Rooney, P. W. et al., Phys. Rev. Lett. 75, 843 (1995).Google Scholar
17. Klemmer, T. et al., Scripta Met. Mater. 33, 1793 (1992).Google Scholar
18. Brandie, H. et al., IEEE Trans. Magn. 28, 2967 (1992).Google Scholar
19. Weller, D. et al., J. Magn. Magn. Mater. 93, 183 (1991).Google Scholar
20. Weiler, D. and Reim, W., Appl. Phys. A 49, 599 (1989).Google Scholar