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Phase Transformations in Layered Fe-Si Structures

Published online by Cambridge University Press:  15 February 2011

M. Fanciulli ,
C. Rosenblad ,
G. Weyer ,
H. Von Känel ,
N. Onda ,
V. Nevolin  and
A. Zenkevich
M. Fanciulli
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark
C. Rosenblad
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark
G. Weyer
Affiliation:
Institute of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark
H. Von Känel
Affiliation:
Laboratory for Solid State Physics, ETH-Zürich, CH-8093 Zürich, Switzerland
N. Onda
Affiliation:
Laboratory for Solid State Physics, ETH-Zürich, CH-8093 Zürich, Switzerland
V. Nevolin
Affiliation:
Moskow Engineering Physics Institute, 115 409 Moskow, Russia
A. Zenkevich
Affiliation:
Moskow Engineering Physics Institute, 115 409 Moskow, Russia
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Abstract

The kinetics of the phase transformations of the Fe-Si system and the Si/Fe and Fe/Si interfaces have been investigated by 57Fe conversion electron Mössbauer spectroscopy (CEMS). Single crystalline Fe films grown on Si(111) by molecular beam epitaxy (MBE) and polycrystalline Fe films grown by pulsed laser ablation deposition (PLD) have been thermally treated in vacuum and the formation of the different silicide phases has been monitored as function of temperature and time by CEMS.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 402: Symposium H – Silicide Thin Films-Fabrication, Properties and Applications , 1995 , 319
Copyright
Copyright © Materials Research Society 1996

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