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Laser-Induced Atomic Chlorine Etching of Silicon
Published online by Cambridge University Press: 25 February 2011
Abstract
UV laser photolysis of chlorine (λ = 350-360 nm) has been used to produce a microscopic atomic chlorine source. Crystalline silicon has been etched and deep, through-wafer vias have been fabricated. The etching process has been modeled and both theoretical and experimental results are given.
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- Copyright © Materials Research Society 1989
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