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The Effect of a Passivation Over-Layer on Tile Mechanisms of Stress Relaxation in Continuous Films and Narrow Lines of Aluminum

Published online by Cambridge University Press:  15 February 2011

C. A. Paszkiet
Affiliation:
Department of Materials Science and Engineering, Bard Hall Cornell University, Ithaca, New York 14853
M. A. Korhonen
Affiliation:
Department of Materials Science and Engineering, Bard Hall Cornell University, Ithaca, New York 14853
Che-Yu Li
Affiliation:
Department of Materials Science and Engineering, Bard Hall Cornell University, Ithaca, New York 14853
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Abstract

Stress relaxation was studied in bare and nitride-covered continuous films and narrow lines of aluminum. The rate of relaxation in unpassivated metallizations is shown to be consistent with a dislocation-controlled mechanism. Relaxation in passivated lines appears to depend on grain boundary diffusion-controlled void growth. In passivated continuous films, two rate-controlling mechanisms appear to operate in sequence.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

[1] Korhonen, M. A., Paszkiet, C. A., Black, R. D., and Li, Che-Yu. Stress relaxation of continuous film and narrow line metallizations of aluminum on silicon substrates. Scripta Metallurgica et Materialia, 24:22972302, 1990.Google Scholar
[2] Colgan, E. G., Li, C.-Y., and Mayer, J. W.. Void formation in thin Al films. Applied Physics Letters, 51(6):424426, August 1987.Google Scholar
[3] Korhonen, M. A. and Paszkiet, Christine A.. X-ray determination of the residual stresses in thin aluminum films deposited on silicon substrates. Scripta Metallurgica, 23:14491454, 1989.Google Scholar
[4] Tönshoff, H. K., Brinksmeier, E., and Nölke, H. H.. Anwendung der Kreuzkorrelationsmethode zur rechnerunterstfitzten röntgenographischen eigenspannungsmessung. Zeitschrift fur Metallkunde, 72:349354, 1981.Google Scholar
[5] Paszkiet, C. A.. The evolution of thermal stresses in thin, continuous films and in thin, narrow aluminum lines. Ph.D. Thesis in preparation.Google Scholar
[6] Taylor, A.. X-Ray Metallography. John Wiley and Sons, New York-London, 1961.Google Scholar
[7] Stone, D., LaFontaine, W.R., Alexopoulos, P., Wu, T.-W., and Li, Che-Yu. An investigation of hardness and adhesion of sputter-deposited aluminum on silicon by utilizing a continuous indentation test. Journal of Materials Research, 3(1):141147, Jan/Feb 1988.Google Scholar
[8] Doerner, M. F., Gardner, D. S., and Nix., W. D. Plastic properties of thin films on substrates as measured by submicron indentation hardness and substrate curvature techniques. Journal of Materials Research, 1(6):845851, Nov/Dec 1986.Google Scholar
[9] Krausz, A. S. and Eyring., H. Deformation Kinetics. John Wiley and Sons, New York, 1975.Google Scholar
[10] Caillard, D. and Martin, J. L.. Aeda Metallurgica 30, 437 (1982)Google Scholar
[11] Korhonen, M. A., Bergesen, P., and Li, Che-Yu. Mechanisms of inelastic deformation and stress relaxation in thin metallization bonded to hard substrates. MRS Spring Meeting, April 29 - May 3, 1991, Anaheim, California Google Scholar
[12] Paszkiet, C. A., Korhonen, M. A., and Li, Che-Yu. MRS Fall Meeting, December 15, 1990, Boston, MassachusettsGoogle Scholar
[13] Dyson, B. F.. Metal Science 10, 349 (1976)Google Scholar