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The Effect of a Passivation Over-Layer on Tile Mechanisms of Stress Relaxation in Continuous Films and Narrow Lines of Aluminum
Published online by Cambridge University Press: 15 February 2011
Abstract
Stress relaxation was studied in bare and nitride-covered continuous films and narrow lines of aluminum. The rate of relaxation in unpassivated metallizations is shown to be consistent with a dislocation-controlled mechanism. Relaxation in passivated lines appears to depend on grain boundary diffusion-controlled void growth. In passivated continuous films, two rate-controlling mechanisms appear to operate in sequence.
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- Copyright © Materials Research Society 1991
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