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The 2,2,6,6-Tetramethyl-2-Sila-3,5-Heptanedione Route to the Chemical Vapor Deposition of Copper for Gigascale Interconnect Applications

Published online by Cambridge University Press:  17 March 2011

Rolf U. Claessen ,
John T. Welch ,
Paul J. Toscano ,
Kulbinder K. Banger ,
Andrei M. Kornilov ,
Eric T. Eisenbraun  and
Alain E. Kaloyeros
Rolf U. Claessen
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
John T. Welch
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
Paul J. Toscano
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
Kulbinder K. Banger
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
Andrei M. Kornilov
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
Eric T. Eisenbraun
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
Alain E. Kaloyeros
Affiliation:
NYS Center for Advanced Thin Film Technology, Department of Physics and Department of Chemistry, University at Albany, SUNY Albany, NY 12222, U.S.A
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Abstract

A new class of copper(II) precursors containing silylated β-diketonate ligands has been developed for the chemical vapor deposition (CVD) growth of copper for applications in ultralarge scale integration interconnect schemes, including conformal seed layer for gigascale Cu integration and ultrathin Cu lines with enhanced conductivity characteristics. Cu(tmshd)2 (tmshdH = 2,2,6,6-tetramethyl-2-sila-3,5-heptanedione) has been studied as a representative compound and is appreciably more volatile than nonsilylated compounds such as Cu(tmhd)2 or Cu(tmod)2 (tmhdH = 2,2,6,6-tetramethyl-3,5-heptanedione; tmodH = 2,2,7-trimethyl- 3,5- octanedione). The CVD process employs Cu(tmshd)2 as the metalorganic precursor and hydrogen as the reducing and carrier gas. These films were deposited using a custom made, cold wall, stainless steel CVD. Copper films were produced at a substrate temperature of 250 – 320 °C, hydrogen flow rates of 20 - 100 sccm, deposition pressure of 0.2 - 1 Torr, and a source temperature of 120 – 135 °C. The films were analyzed by X-ray photoelectron spectroscopy, cross section scanning electron microscopy, transmission electron microscopy, four-point resistivity probe, Rutherford backscattering spectrometry and Auger electron spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 612: Symposium D – Materials, Technology & Reliability for Advanced Interconnects.. , 2000 , D6.8.1
Copyright
Copyright © Materials Research Society 2000

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References

1. The Chemistry of Metal CVD, ed. Kodas, T. T., Hampden-Smith, M. J. (VCH Publishers: New York, 1994).10.1002/9783527615858Google Scholar
2. Spenser, J. T., Prog. Inorg. Chem., 41, 145 (1994).Google Scholar
3. Murarka, S. P., Hymes, S. W., Crit. Rev. Solid State Mater. Sci., 20, 87 (1995).10.1080/10408439508243732Google Scholar
4. Marks, T. J., Pure Appl. Chem., 67, 313 (1995).10.1351/pac199567020313Google Scholar
5. SIA Roadmap 1999 Google Scholar
6. Mehrotra, R. C., Bohra, R., Gaur, D. P., Metal β-Diketonates and Allied Derivatives (Academic Press: New York, 1978).Google Scholar
7. Sievers, R. E., Sadlowski, J. E., Science (Washington, D.C.), 201, 217 (1978).10.1126/science.201.4352.217Google Scholar
8. Toscano, P. J., Dettelbacher, C., Waechter, J., Pavri, N. P., Hunt, D. H., Eisenbraun, E. T., Zheng, B., Kaloyeros, A. E.,Coord. Chem., 38, 319 (1996).10.1080/00958979608024526Google Scholar
9. Kaloyeros, A. E., Fury, M. A., MRS Bull., 18, 22 (1993).10.1557/S0883769400047291Google Scholar
10. Hitchman, M. L., Shamlian, S. H., Gilliland, D. D., Cole-Hamilton, D. J., Nash, J. A. P., Thompson, S. C., Cook, S. L., Mater. Chem., 5, 47 (1995).10.1039/jm9950500047Google Scholar
11. Richards, B. C., Cook, S. L., Pinch, D. L., Andrews, G. W., Lengeling, G., Schulte, B., Jürgensen, H., Shen, Y. Q., Vase, P., Freltoft, T., Spee, C. I. M. A., Linden, J. L., Hitchman, L., Shamlian, S. H., Brown, A., Physica C (Amsterdam), 252, 229 (1995).10.1016/0921-4534(95)00441-6Google Scholar
12. Banger, K. K., Kornilov, A. M., Claessen, R. U., Eisenbraun, E. T., Kaloyeros, A. E., Toscano, P. J., Welch, J. T., Angew. Chem. (submitted).Google Scholar