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TEM Study of Copper Oxide Nano-Particles in Silica Glass Prepared by Co-Implantation of Copper and Oxygen Ions

Published online by Cambridge University Press:  02 July 2020

S. X. Wang ,
S. Nakao ,
L. M. Wang ,
Y. Miyagawa ,
S. Miyagawa  and
M. Ikeyama
S. X. Wang
Affiliation:
Department of Nuclear Engineering & Radiological Sciences, University of Michigan, Ann Arbor, MI48109USA.
S. Nakao
Affiliation:
National Industrial Research Institute of Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya, 462-8510Japan.
L. M. Wang
Affiliation:
Department of Nuclear Engineering & Radiological Sciences, University of Michigan, Ann Arbor, MI48109USA.
Y. Miyagawa
Affiliation:
National Industrial Research Institute of Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya, 462-8510Japan.
S. Miyagawa
Affiliation:
National Industrial Research Institute of Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya, 462-8510Japan.
M. Ikeyama
Affiliation:
National Industrial Research Institute of Nagoya, 1-1 Hirate-cho, Kita-ku, Nagoya, 462-8510Japan.
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Extract

The formation of nano-particles in silica glass by ion implantation has attracted great attentions because of the applications for visible luminescence and nonlinear optical devices. Ion implantation is a unique technique for producing nano-particles, with the advantages of high controllability of beam position, depth and distribution of projectiles, concentration, high purity and ability to overcome low solubility restrictions.

Optical grade silica glasses were used as the substrates. Ion implantation was performed with a 1.7 MV tandem-type ion accelerator (NEC 5SDH-II pelletron accelerator) of NERIN. The substrates were implanted with 1.0 MeV O+ and 1.8 MeV Cu+. Projected ranges were calculated by SRIM-2000 to be 1.5 μm (for O+) and 1.4 μm (for Cu+). Samples were cooled with liquid nitrogen to reduce the beam heating. The ion current densities of O+ and Cu+ were 6 and 2 μA/cm2, respectively.

Type
Sir John Meurig Thomas Symposium: Microscopy and Microanalysis in the Chemical Sciences
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 62 - 63
Copyright
Copyright © Microscopy Society of America

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References

1.Iwayama, T. S., Nakao, S. and Saitoh, K., Appl. Phys. Lett. 65 (1994) 1814.CrossRefGoogle Scholar
2. SRIM - The Stopping and Range of Ions in Matter, http://www.research.ibm.com/ionbeams/SRIM/SRIMINTR.HTM.Google Scholar
3. The TEM work was performed at the Electron Microbeam Analysis Laboratory at the University of Michigan.Google Scholar