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S9000X - Next Generation of Ultra-High Resolution SEM for Enhanced Analysis and Xe Plasma FIB for Ultra-Fast and Gentle Sputtering

Published online by Cambridge University Press:  01 August 2018

Miloslav Havelka ,
Jaroslav Jiruse ,
Tomas Hrncif ,
Jan Polster ,
Rostislav Vana  and
Samuel Zachej
Miloslav Havelka
Affiliation:
TESCAN Brno, Physics Department, Brno, Czech Republic
Jaroslav Jiruse
Affiliation:
TESCAN Brno, Physics Department, Brno, Czech Republic
Tomas Hrncif
Affiliation:
TESCAN Brno, Physics Department, Brno, Czech Republic
Jan Polster
Affiliation:
TESCAN Brno, Physics Department, Brno, Czech Republic
Rostislav Vana
Affiliation:
TESCAN Brno, R&D Applications, Brno, Czech Republic
Samuel Zachej
Affiliation:
TESCAN Brno, R&D Applications, Brno, Czech Republic

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1116 - 1117
Copyright
© Microscopy Society of America 2018 

References

References:

[1] Jiruse, J, et al, Microscopy & Microanalysis 19(Suppl 2 2013) p. 1302.Google Scholar
[2] Shao, Z Lin, PSD Rev. Sci. Instrum. 60(11 1989) p. 3434.Google Scholar
[3] Jiruse, J, et al, Ultramicroscopy 146, 27 2014.Google Scholar