No CrossRef data available.
Article contents
Resolving Atomic Scale Chemistry and Structure at NO and Ba Passivated SiC/SiO2Interfaces
Published online by Cambridge University Press: 25 July 2016
Abstract
An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
![Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'](https://static.cambridge.org/content/id/urn%3Acambridge.org%3Aid%3Aarticle%3AS1431927616009132/resource/name/firstPage-S1431927616009132a.jpg)
- Type
- Abstract
- Information
- Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 1658 - 1659
- Copyright
- © Microscopy Society of America 2016
References
References:
[9] JHD, WX and JML acknowledge the Analytical Instrumentation Facility (AIF) at North Carolina State University. JHD acknowledges support by the National Science Foundation Graduate Research Fellowship (Grant DGE-1252376). Research was sponsored by the Army Research Laboratory under Cooperative Agreement #W911NF-12-2-0064.Google Scholar