Hostname: page-component-78c5997874-94fs2 Total loading time: 0 Render date: 2024-11-04T21:42:16.020Z Has data issue: false hasContentIssue false
  • English
  • Français

Quantitative Aberration-Corrected STEM for Studies of Oxide Superlattices and Topological Defects in Layered Ferroelectrics

Published online by Cambridge University Press:  30 July 2020

Albina Borisevich ,
Rama Vasudevan ,
Yu Zhou ,
Kyle Kelley ,
Donovan Leonard ,
Summayya Kouser ,
Sabine Neumayer ,
Peter Maksymovych ,
Sokrates Pantelides  and
Steven May
...Show all authors
Albina Borisevich
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States
Rama Vasudevan
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States
Yu Zhou
Affiliation:
Drexel University, Philadelphia, Pennsylvania, United States
Kyle Kelley
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States
Donovan Leonard
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States
Summayya Kouser
Affiliation:
Vanderbilt University, Nashville, Tennessee, United States
Sabine Neumayer
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States
Peter Maksymovych
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States
Sokrates Pantelides
Affiliation:
Vanderbilt University, Nashville, Tennessee, United States
Steven May
Affiliation:
Drexel University, Philadelphia, Pennsylvania, United States
Nina Balke
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, United States

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Pushing the Limits of Detection in Quantitative (S)TEM Imaging, EELS, and EDX
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 1194 - 1195
Check for updates
Copyright
Copyright © Microscopy Society of America 2020

References

MacLaren, Ian & Ramasse, Quentin M., International Materials Reviews, 59, 115–131 (2014)10.1179/1743280413Y.0000000026CrossRefGoogle Scholar
Moon, E. J., et al. , Phys. Rev. Lett. 119, 197204 (2017).10.1103/PhysRevLett.119.197204CrossRefGoogle Scholar
Zhou, Y., et al. , Adv. Mater. Interfaces, in press (2020).Google Scholar
Belianinov, A. et al. Adv Struct Chem Imag, 1, 6 (2015).10.1186/s40679-015-0006-6CrossRefGoogle Scholar
Brehm, J.A, et al. , Nat. Mater., 19, 43 (2020).10.1038/s41563-019-0532-zCrossRefGoogle Scholar
Hÿtch, M. J., Snoeck, E., and Kilaas, R., Ultramicroscopy 74, 131–146 (1998)10.1016/S0304-3991(98)00035-7CrossRefGoogle Scholar
Research was sponsored by the Division of Materials Science and Engineering, Basic Energy Sciences (BES), Office of Science, US Department of Energy (DOE).Google Scholar