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Prevention Beats Removal: Avoiding Stripe Artifacts from Current Variation in Particle Beam Microscopy Through Time-Resolved Sensing

Published online by Cambridge University Press:  30 July 2021

Luisa Watkins ,
Sheila Seidel ,
Minxu Peng ,
Akshay Agarwal ,
Christopher Yu  and
Vivek Goyal
Luisa Watkins
Affiliation:
Boston University, United States
Sheila Seidel
Affiliation:
Boston University, United States
Minxu Peng
Affiliation:
Boston University, United States
Akshay Agarwal
Affiliation:
Massachusetts Institute of Technology, United States
Christopher Yu
Affiliation:
Draper Laboratory, United States
Vivek Goyal
Affiliation:
Boston University, Boston, Massachusetts, United States

Abstract

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Type
Advances in Focused Ion Beam Instrumentation, Applications and Techniques in and Materials and Life Sciences
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 422 - 425
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Notte, J. and Huang, J., The Helium Ion Microscope, pp. 3-30, Springer International Publishing, Cham, 2016.CrossRefGoogle Scholar
Barlow, A. J., Portoles, J. F., Sano, N., and Cumpson, P. J., “Removing beam current artifacts in helium ion microscopy: A comparison of image processing techniques,” Microscopy and Microanalysis, vol. 22, no. 5, pp. 939-947, Oct. 2016.CrossRefGoogle ScholarPubMed
Peng, M., Murray-Bruce, J., Berggren, K. K., and Goyal, V. K., “Source shot noise mitigation in focused ion beam microscopy by time-resolved measurement,” Ultramicroscopy, vol. 211, pp. 112948, 2020.CrossRefGoogle ScholarPubMed
Sim, K. S., Thong, J. T. L., and Phang, J. C. H., “Effect of shot noise and secondary emission noise in scanning electron microscope images,” Scanning, vol. 26, no. 1, pp. 36-40, 2004.CrossRefGoogle Scholar
Corless, R. M., Gonnet, G. H., Hare, D. E. G., Jeffrey, D. J., and Knuth, D. E., “On the Lambert W function,” Advances in Computational Mathematics, vol. 5, no. 1, pp. 329-359, Dec. 1996.CrossRefGoogle Scholar
Peng, M., Murray-Bruce, J., and Goyal, V. K., “Time-resolved focused ion beam microscopy: Modeling, estimation methods, and analyses,” arXiv:2011.08402, 2020.Google Scholar
Thermo Fisher Scientific, five images from https://www.fei.com/uploadedimages/FEISite/Content/Image_Gallery/Images: 2016_Image_Contest/IM_20161024_Abbaspour_79_bouquet.jpg, 2014_Image_Contest/IM_20141118_GUEDJ_81_Thegoldisland.jpg, Shale_22%20nA.jpg, IM_20100408_Abd.%20Jalil_4_seed_008_lg.jpg, and 2012_Image_Contest/FEI/IM_20120912_ILIESCU_88_Bubbles_lg.jpg.Google Scholar
Notte, J., Ward, B., Economou, N., Hill, R., Percival, R., Farkas, L., and McVey, S., “An introduction to the helium ion microscope,” in AIP Conference Proceedings. AIP, 2007, vol. 931, pp. 489-496.CrossRefGoogle Scholar
Lin, Y. and Joy, D. C., “A new examination of secondary electron yield data,” Surface Interface Analysis, vol. 37, no. 11, pp. 895-900, 2005.CrossRefGoogle Scholar