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Performance of a high count rate silicon drift x-ray detector on the anl 300 kv advanced analytical electron microscope.

Published online by Cambridge University Press:  01 August 2003

N. J. Zaluzec ,
J. S. Iwanczyk ,
B. E. Patt ,
S. Barkan  and
L. Feng
N. J. Zaluzec
Affiliation:
Argonne National Laboratory, Electron Microscopy Center, Materials Science Div., Argonne, Il, USA
J. S. Iwanczyk
Affiliation:
Photon Imaging Inc., 19355 Business Center Drive, Suite # 8, Northridge, Ca. USA
B. E. Patt
Affiliation:
Photon Imaging Inc., 19355 Business Center Drive, Suite # 8, Northridge, Ca. USA
S. Barkan
Affiliation:
Photon Imaging Inc., 19355 Business Center Drive, Suite # 8, Northridge, Ca. USA
L. Feng
Affiliation:
Photon Imaging Inc., 19355 Business Center Drive, Suite # 8, Northridge, Ca. USA

Abstract

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Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 892 - 893
Copyright
Copyright © Microscopy Society of America 2003