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Liquid Phase Electron-Beam-Induced Deposition on Bulk Substrates Using Environmental Scanning Electron Microscopy

Published online by Cambridge University Press:  03 March 2014

Matthew Bresin ,
Aurelien Botman ,
Steven J Randolph ,
Marcus Straw  and
Jeffrey Todd Hastings
Matthew Bresin
Affiliation:
Department of Electrical and Computer Engineering, University of Kentucky, 453 F. Paul Anderson Tower, Lexington, KY 40506, USA
Aurelien Botman
Affiliation:
FEI Company, 5350 Dawson Creek Drive, Hillsboro, OR 97214, USA
Steven J Randolph
Affiliation:
FEI Company, 5350 Dawson Creek Drive, Hillsboro, OR 97214, USA
Marcus Straw
Affiliation:
FEI Company, 5350 Dawson Creek Drive, Hillsboro, OR 97214, USA
Jeffrey Todd Hastings*
Affiliation:
Department of Electrical and Computer Engineering, University of Kentucky, 453 F. Paul Anderson Tower, Lexington, KY 40506, USA
*
*Corresponding author.[email protected]
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Abstract

The introduction of gases, such as water vapor, into an environmental scanning electron microscope is common practice to assist in the imaging of insulating or biological materials. However, this capability may also be exploited to introduce, or form, liquid phase precursors for electron-beam-induced deposition. In this work, the authors report the deposition of silver (Ag) and copper (Cu) structures using two different cell-less in situ deposition methods—the first involving the in situ hydration of solid precursors and the second involving the insertion of liquid droplets using a capillary style liquid injection system. Critically, the inclusion of surfactants is shown to drastically improve pattern replication without diminishing the purity of the metal deposits. Surfactants are estimated to reduce the droplet contact angle to below ~10°.

Keywords

electron-beam-induced depositionliquid phaseliquid injection systemcontact anglenanolithography
Type
In Situ Special Section
Information
Microscopy and Microanalysis , Volume 20 , Issue 2 , April 2014 , pp. 376 - 384
Copyright
© Microscopy Society of America 2014 

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References

Botman, A., Mulders, J.J.L. & Hagen, C.W. (2009). Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective. Nanotechnology 20(37), 372001.Google Scholar
Bresin, M., Chamberlain, A., Donev, E.U., Samantaray, C.B., Schardien, G.S. & Hastings, J.T. (2013 a). Electron-beam-induced deposition of bimetallic nanostructures from bulk liquids. Angew Chem Int Ed 52(31), 8004–8007.Google Scholar
Bresin, M., Nehru, N. & Hastings, J.T. (2013 b). Focused electron-beam induced deposition of plasmonic nanostructures from aqueous solutions. In Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI , von Freymann, G., Schoenfeld, W.V. & Rumpf, R.C. (Eds.), p. 861306. San Francisco, CA: SPIE—International Society for Optical Engineering.Google Scholar
de Jonge, N. & Ross, F.M. (2011). Electron microscopy of specimens in liquid. Nat Nanotechnol 6(11), 695–704.CrossRefGoogle ScholarPubMed
Donev, E.U. & Hastings, J.T. (2009 a). Electron-beam-induced deposition of platinum from a liquid precursor. Nano Lett 9(7), 2715–2718.CrossRefGoogle ScholarPubMed
Donev, E.U. & Hastings, J.T. (2009 b). Liquid-precursor electron-beam-induced deposition of Pt nanostructures: Dose, proximity, resolution. Nanotechnology 20(50), 505302.Google Scholar
Friedli, V., Utke, I., Mølhave, K. & Michler, J. (2009). Dose and energy dependence of mechanical properties of focused electron-beam-induced pillar deposits from Cu(C5HF6O2)2. Nanotechnology 20(38), 385304.CrossRefGoogle ScholarPubMed
Hermansson, K., Lindberg, U., Hok, B. & Palmskog, G. (1991). Wetting properties of silicon surfaces. In Solid-State Sensors and Actuators Digest of Technical Papers, International Conference on TRANSDUCERS '91, pp. 193–196. San Francisco, CA: IEEE.CrossRefGoogle Scholar
Joy, D.C. & Joy, C.S. (2006). Scanning electron microscope imaging in liquids—Some data on electron interactions in water. J Microsc 221(2), 84–88.Google Scholar
Mackus, A.J.M., Mulders, J.J.L., van de Sanden, M.C.M. & Kessels, W.M.M. (2010). Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition. J Appl Phys 107(11), 116102–116103.CrossRefGoogle Scholar
Ochiai, Y., Fujita, J.-I. & Matsui, S. (1996). Electron-beam-induced deposition of copper compound with low resistivity. J Vac Sci Technol B 14, 3887–3891.Google Scholar
Ocola, L.E., Joshi-Imre, A., Kessel, C., Chen, B., Park, J., Gosztola, D. & Divan, R. (2012). Growth characterization of electron-beam-induced silver deposition from liquid precursor. J Vac Sci Technol B 30(6), 06FF08.CrossRefGoogle Scholar
Randolph, S.J., Botman, A. & Toth, M. (2013). Capsule-free fluid delivery and beam-induced electrodeposition in a scanning electron microscope. RSC Advances 3(43), 20016–20023.Google Scholar
Roberts, N.A., Fowlkes, J.D., Magel, G.A. & Rack, P.D. (2013). Enhanced material purity and resolution via synchronized laser assisted electron beam induced deposition of platinum. Nanoscale 5(1), 408–415.Google Scholar
Schardein, G., Donev, E.U. & Hastings, J.T. (2011). Electron-beam-induced deposition of gold from aqueous solutions. Nanotechnology 22(1), 015301.Google Scholar
Stelmashenko, N.A., Craven, J.P., Donald, A.M., Terentjev, E.M. & Thiel, B.L. (2001). Topographic contrast of partially wetting water droplets in environmental scanning electron microscopy. J Microsc 204(2), 172–183.Google Scholar
Utke, I., Hoffmann, P. & Melngailis, J. (2008). Gas-assisted focused electron beam and ion beam processing and fabrication. J Vac Sci Technol B 26(4), 1197–1276.CrossRefGoogle Scholar
Williams, R. & Goodman, A.M. (1974). Wetting of thin layers of SiO[sub 2] by water. Appl Phys Lett 25(10), 531–532.CrossRefGoogle Scholar