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Image Simulation and Analysis to Predict the Sensitivity Performance of a Multi-Electron Beam Critical Dimension Metrology Tool

Published online by Cambridge University Press:  04 August 2017

Maseeh Mukhtar  and
Brad Thiel
Maseeh Mukhtar
Affiliation:
Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY.
Brad Thiel
Affiliation:
Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY.

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1494 - 1495
Copyright
© Microscopy Society of America 2017 

References

[1] Bunday, B. “HVM Metrology Challenges towards the 5 nm Node”, Metrology, Inspection, and Process Control for Microlithography XXX, Proc. SPIE 9778.Google Scholar
[2] Mukhtar, M., et al, Microsc. Microanal. 22(Suppl 3 2016). p. 620.Google Scholar
[3] Mukhtar, M., et al, J. Micro/Nanolith. MEMS MOEMS 15(3 2016). p. 034004.Google Scholar