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High Contrast SEM Observation of Semiconductor Dopant Profile using TripleBeam® System

Published online by Cambridge University Press:  04 August 2017

Yuka Aizawa ,
Takahiro Sato ,
Takeshi Sunaoshi ,
Hiroaki Matsumoto ,
Toshihide Agemura ,
Shota Torikawa ,
Ikuko Nakatani  and
Masahiro Kiyohara
Yuka Aizawa
Affiliation:
Hitachi High-Technologies Corp., Science System Product Div., Ibaraki, Japan.
Takahiro Sato
Affiliation:
Hitachi High-Technologies Corp., Science System Product Div., Ibaraki, Japan.
Takeshi Sunaoshi
Affiliation:
Hitachi High-Technologies Corp., Science System Product Div., Ibaraki, Japan.
Hiroaki Matsumoto
Affiliation:
Hitachi High-Technologies Corp., Science System Product Div., Ibaraki, Japan.
Toshihide Agemura
Affiliation:
Hitachi High-Technologies Corp., Science System Product Div., Ibaraki, Japan.
Shota Torikawa
Affiliation:
Hitachi High-Tech Science Corp., Beam Technology Systems Design Dept., Shizuoka, Japan.
Ikuko Nakatani
Affiliation:
Hitachi High-Tech Science Corp., Beam Technology Systems Design Dept., Shizuoka, Japan.
Masahiro Kiyohara
Affiliation:
Hitachi High-Tech Science Corp., Beam Technology Systems Design Dept., Shizuoka, Japan.

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1508 - 1509
Copyright
© Microscopy Society of America 2017 

References

[1] Takahashi, H., et al, Proc. 16th International microscopy congress 2006). p. 1104.Google Scholar
[2] Sunaoshi, T, et al Proceedings of the 2016 IEEE 23rd IPFA, p.148.Google Scholar