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Considerations and Challenges with Characterizing Si/SiGe Interfaces

Published online by Cambridge University Press:  25 July 2016

Ondrej Dyck
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Lab, Oak Ridge, TN, USA
Donovan Leonard
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Lab, Oak Ridge, TN, USA
Jonathan Poplawsky
Affiliation:
Center for Nanophase Materials Sciences, Oak Ridge National Lab, Oak Ridge, TN, USA
Emily Pritchett
Affiliation:
HRL Laboratories, LLC., Malibu, CA, USA
Andrey A. Kiselev
Affiliation:
HRL Laboratories, LLC., Malibu, CA, USA
Clayton A. Jackson
Affiliation:
HRL Laboratories, LLC., Malibu, CA, USA
Lisa F. Edge
Affiliation:
HRL Laboratories, LLC., Malibu, CA, USA

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

[1] Luna, E., et al., Appl. Phys. Lett. 92, p 141913 (2008).Google Scholar
[2] Luna, E., et al., Appl. Phys. Lett. 96, p 021904 (2010).Google Scholar
[4] Voyles, P. M., et al., Ultramicroscopy 96, p. 251 (2002).Google Scholar