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Atomic Level Structural Modulations at the Negatively Charged Domain Walls in BiFeO3 Films

Published online by Cambridge University Press:  04 August 2017

W. Y. Wang
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
Y. L. Tang
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
Y. L. Zhu
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
Y. B. Xu
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
Y. Liu
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
Y. J. Wang
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
S. Jagadeesh
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China
X. L. Ma
Affiliation:
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang, China School of Materials Science and Engineering, Lanzhou University of Technology, Langongping Road 287, 730050 Lanzhou, China

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2017 

References

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[7] The authors acknowledge funding from the National Natural Science Foundation of China (No. 51231007, 51571197, 51501194, 51671194 and 51521091), National Basic Research Program of China (2014CB921002), and the Key Research Program of Frontier Sciences CAS (QYZDJ-SSW-JSC010). YL Tang acknowledges the IMR SYNL-T.S. Kê Research Fellowship and the Youth Innovation Promotion Association CAS (No. 2016177).Google Scholar