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Assessing Hexagonal Boron Nitride Crystal Quality by Defect Sensitive Etching

Published online by Cambridge University Press:  04 August 2017

T. Hoffman ,
Y. Zhang ,
S. Liu ,
N. Khan ,
M.E. Twigg ,
N.D. Bassim  and
J.H. Edgar
T. Hoffman
Affiliation:
Dept of Chemical Engineering, Kansas State University, Manhattan, Kansas, USA
Y. Zhang
Affiliation:
Dept of Chemical Engineering, Kansas State University, Manhattan, Kansas, USA
S. Liu
Affiliation:
Dept of Chemical Engineering, Kansas State University, Manhattan, Kansas, USA
N. Khan
Affiliation:
School of Science and Technology, Georgia Gwinnett College, Lawrenceville, Georgia, USA
M.E. Twigg
Affiliation:
United States Naval Research Laboratory, Washington, DC, USA
N.D. Bassim
Affiliation:
Dept of Materials Science and Engineering, JHE 357, McMaster University, Hamilton, Ontario, CANADA
J.H. Edgar
Affiliation:
Dept of Chemical Engineering, Kansas State University, Manhattan, Kansas, USA

Abstract

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Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1518 - 1519
Copyright
© Microscopy Society of America 2017 

References

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