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Accessing Atomic-scale Phosphorus Dopant Distribution in Precise Silicon Devices by Advanced STEM Imaging and Spectroscopy
Published online by Cambridge University Press: 30 July 2020
Abstract
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- Type
- Pushing the Limits of Detection in Quantitative (S)TEM Imaging, EELS, and EDX
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- Copyright
- Copyright © Microscopy Society of America 2020
References
Phillips, P.J. et al. , Ultramicroscopy 116, 47–55 (2012).10.1016/j.ultramic.2012.03.013CrossRefGoogle Scholar
Lu, P., Romero, E., Lee, S., MacManus-Driscoll, J. L. & Jia, Q. X., Microsc. Microanal. 20, 1782–1792 (2014).10.1017/S1431927614013245CrossRefGoogle Scholar
Lu, P., Zhou, L., Kramer, M.J. & Smith, D. J., Sci. Rep. 4, 3945–3949 (2014).10.1038/srep03945CrossRefGoogle Scholar
Sandia National Laboratories is a multi-mission laboratory managed and operated by National Technology and Engineering Solutions of Sandia LLC, a wholly owned subsidiary of Honeywell International Inc., for the U.S. Department of Energy's National Nuclear Security Administration under contract DE-NA0003525. This paper describes objective technical results and analysis. Any subjective views or opinions that might be expressed in the paper do not necessarily represent the views of the U.S. Department of Energy or the United States Government. This work was supported by the Laboratory Directed Research and Development Program at Sandia National Laboratories and was performed, in part, at the Center for Integrated Nanotechnologies, a U.S. DOE, Office of Basic Energy Sciences user facility.Google Scholar
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