Single-shot laser-induced damage threshold (LIDT) measurements of multi-type free-standing ultrathin foils were performed in a vacuum environment for 800 nm laser pulses with durations τ ranging from 50 fs to 200 ps. The results show that the laser damage threshold fluences (DTFs) of the ultrathin foils are significantly lower than those of corresponding bulk materials. Wide band gap dielectric targets such as SiN and formvar have larger DTFs than semiconductive and conductive targets by 1–3 orders of magnitude depending on the pulse duration. The damage mechanisms for different types of targets are studied. Based on the measurement, the constrain of the LIDTs on the laser contrast is discussed.

Nonclassical light sources have a vital role in quantum optics as they offer a unique resource for studies in quantum technology. However, their applicability is restricted by their low intensity, while the development of new schemes producing intense nonclassical light is a challenging task. In this perspective article, we discuss potential schemes that could be used towards the development of high photon flux nonclassical light sources and their future prospects in nonlinear optics.

We report on a two-arm hybrid high-power laser system (HPLS) able to deliver 2 × 10 PW femtosecond pulses, developed at the Bucharest-Magurele Extreme Light Infrastructure Nuclear Physics (ELI-NP) Facility. A hybrid front-end (FE) based on a Ti:sapphire chirped pulse amplifier and a picosecond optical parametric chirped pulse amplifier based on beta barium borate (BBO) crystals, with a cross-polarized wave (XPW) filter in between, has been developed. It delivers 10 mJ laser pulses, at 10 Hz repetition rate, with more than 70 nm spectral bandwidth and high-intensity contrast, in the range of 1013:1. The high-energy Ti:sapphire amplifier stages of both arms were seeded from this common FE. The final high-energy amplifier, equipped with a 200 mm diameter Ti:sapphire crystal, has been pumped by six 100 J nanosecond frequency doubled Nd:glass lasers, at 1 pulse/min repetition rate. More than 300 J output pulse energy has been obtained by pumping with only 80% of the whole 600 J available pump energy. The compressor has a transmission efficiency of 74% and an output pulse duration of 22.7 fs was measured, thus demonstrating that the dual-arm HPLS has the capacity to generate 10 PW peak power femtosecond pulses. The reported results represent the cornerstone of the ELI-NP 2 × 10 PW femtosecond laser facility, devoted to fundamental and applied nuclear physics research.

Motivated by the achieved high intensities of novel extreme ultraviolet (XUV) radiation sources, such as free electron lasers and laser-driven high harmonic generation beamlines, we elaborate on their perspective in inducing observable strong field effects. The feasibility of extending such effects from the infrared and visible spectral regimes in the XUV domain is supported through numerically calculated models of near-future experiments. We highlight the advancement of performing studies in the time domain, using ultra-short XUV pulses, which allows for the temporal evolution of such effects to be followed. Experimental and theoretical obstacles and limitations are further discussed.

As the key part for energy amplification of high-power laser systems, disk amplifiers must work in an extremely clean environment. Different from the traditional cleanliness control scheme of active intake and passive exhaust (AIPE), a new method of active exhaust and passive intake (AEPI) is proposed in this paper. Combined with computational fluid dynamics (CFD) technology, through the optimization design of the sizes, shapes, and locations of different outlets and inlets, the turbulence that is unfavorable to cleanliness control is effectively avoided in the disk amplifier cavity during the process of AEPI. Finally, the cleanliness control of the cavity of the disk amplifier can be realized just by once exhaust. Meanwhile, the micro negative pressure environment in the amplifier cavity produced during the exhaust process reduces the requirement for sealing. This method is simple, time saving, gas saving, efficient, and safe. It is also suitable for the cleanliness control of similar amplifiers.