X-ray diffraction methods have been used successfully for the analysis of platinum silicide films of 100 Å or less in thickness. Conventional X-ray diffraction was utilized for phase identification, planar orientation, and crystalline size determination. Low-angle X-ray specular reflectivity analysis measured film thickness. As the nominal film thickness approached 100 Å, it was observed that the deposited platinum film thickness was larger than expected and longer anneal times would be required to ensure homogeneous platinum silicide phase composition.
