We study the details of a gradual change in electron properties from
those of a nearly-free-electron (NFE) metal to those of a strongly-coupled
plasma, in ultrashort pulse energy deposition in solid metal targets. Time
scales shorter than those of a target surface layer expansion are
considered. Both the case of an optical laser (visible or near infrared
wavelengths range) and of a free electron laser (vacuum ultraviolet or
X-ray) are treated. The mechanisms responsible for the change in electron
behavior are isochoric melting, lattice charge disordering, and electron
mean free path reduction. We find that the transition from metal to plasma
usually occurs via an intermediate stage of a charge-disordered solid
(solid plasma), in which ions are at their lattice sites but the
ionization stages of individual ions differ due to ionization from
localized bound states. Charge disordered state formation is very rapid
(typically, few femtoseconds or few tens of femtoseconds). Pathway to
charge-disordered state differs in simple metals and in noble metals.
Probabilities are derived for electron impact ionization and 3-body
recombination of a bound ionic state in solid-density medium, applicable
both in metal and in plasma regime. An evolution of energy coupling
between electron and ion subsystems, from metallic electron-phonon (e-ph)
to plasma electron-ion (e-i) coupling, is considered. Substantial increase
in coupling parameter is expected as a result of charge disorder.