The paper gives a review of investigations on generation of soft
X-rays and EUV using a gas puff target irradiated with high-power laser
pulses performed during last few years. In the studies a newly developed
double-stream gas puff target approach was used. The gas puff targets were
irradiated with various lasers, including Nd:glass, Kr:F, Nd:YAG, and
iodine lasers. The aim of the studies was to develop efficient and
debris-free laser plasma X-ray and EUV sources for applications in
microscopy, lithography, micro- and nanotechnology.
