Hostname: page-component-cd9895bd7-7cvxr Total loading time: 0 Render date: 2024-12-27T18:14:50.739Z Has data issue: false hasContentIssue false

UV Raman Study of A1(LO) and E2 Phonons in InGaN Alloys Grown by Metal-Organic Chemical Vapor Deposition on (0001) Sapphire Substrates

Published online by Cambridge University Press:  17 March 2011

Dimitri Alexson
Affiliation:
North Carolina State University, Physics Department, Raleigh, NC 27695-8202, U.S.A
Leah Bergman
Affiliation:
North Carolina State University, Physics Department, Raleigh, NC 27695-8202, U.S.A
Robert J. Nemanich
Affiliation:
North Carolina State University, Physics Department, Raleigh, NC 27695-8202, U.S.A
Mitra Dutta
Affiliation:
U.S. Army Research Office, P.O. Box 12211, Research Triangle Park, NC 27709
Michael A. Stroscio
Affiliation:
U.S. Army Research Office, P.O. Box 12211, Research Triangle Park, NC 27709
C.A. Parker
Affiliation:
North Carolina State University, Electrical and Computer Engineering, Raleigh, NC 27695
S.M. Bedair
Affiliation:
North Carolina State University, Electrical and Computer Engineering, Raleigh, NC 27695
N.A. El-Masry
Affiliation:
North Carolina State University, Materials Science and Engineering, Raleigh, NC 27695
Fran Adar
Affiliation:
Jobin Yvon HORIBA Group, 3880 Park Avenue, Edison, NJ, 08820-3097, U.S.A
Get access

Abstract

We report on UV Raman spectroscopy of InxGa1−xN thin films grown on (0001) sapphire substrates using a specially designed metal-organic chemical vapor deposition (MOCVD) reactor. Eight films were examined in the compositional range 0<×<0.50. Mid and deep-UV Raman spectroscopy was done with the 325.2 nm line of the HeCd laser and the 244 nm line of a double frequency Ar ion laser. The mode behavior of the A1(LO) and E2 phonons was also investigated. We have found compelling evidence for one-mode behavior for the A1(LO) phonon mode, while our data for the E2 mode deviates from the predictions for one-mode behavior. The results for the A1(LO) mode are consistent with the previously reported phonon mode behavior in AlGaN alloys. Also, evidence regarding the presence of compositional inhomogeneities and spinodal decomposition in InGaN thin films is presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Orton, J.W., Foxon, C.T., Rep. Prog. Phys. 61, 1 (1998)Google Scholar
[2] Demangeot, F., Groenen, J., Frandon, J., Renucci, M.A., Briot, O., Clur, S., Aulonbard, R.L., Appl. Phys. Lett. 72, 2674 (1998)Google Scholar
[3] Cros, A., Angerer, H., Ambacher, O., Stutzmann, M., Hopler, R., Metzger, T., Solid State Commun. 104, 35 (1997)Google Scholar
[4] Piner, E.L., El-Masry, N.A., Liu, S.X., and Bedair, S.M., in Nitride Semiconductors, edited by Ponce, F.A., DenBaars, S.P., Meyer, B.K., Nakamura, S., and Strite, S., Mater. Res. Soc. Proc. 482, 125 (1998)Google Scholar
[5] Kwon, Hyuk-Joo, Lee, Yong-Hyun, Miki, Osamu, Yamano, Hirofumi, Yoshida, Akira, Appl. Phys. Lett. 69, 937 (1996)Google Scholar
[6] Kozawa, T., Kachi, T., Kano, H., Taga, Y., Hashimoto, M, Koide, N., and Manabe, K., J. Appl. Phys 75, 1098 (1994)Google Scholar
[7] Bergman, L., Bremser, M.D., Christman, J.A., King, S.W., Davis, R.F., and Nemanich, R.J., in Raman Analysis of Electron-Phonon Interactions in GaN Films, edited by Ponce, F.A., Moustakas, T.D., Akasaki, I., and Monemar, B.A., (Mater. Res. Soc. Proc. 449, Pittsburgh, PA, 1997), pp.725730.Google Scholar
[8] Inushima, T., Shiraishi, T., and Davydov, V.Yu., Solid State Commun. 110, 491 (1999)Google Scholar
[9] Ho, I-hsiu, Stringfellow, G.B., Appl Phys Lett 69, 2701 (1996)Google Scholar
[10] Doppalapudi, D., Basu, S.N., Ludwig, K.F. Jr, and Moustakas, T.D., J. Appl. Phys. 83, 1389 (1998)Google Scholar
[11] El-Masry, N.A., Piner, E.L., Liu, S.X., Bedair, S.M., Appl. Phys. Lett. 72, 40 (1998)Google Scholar
[12] Davydov, V. Yu, Klochikhin, A. A., Smirnov, M. B., Emstev, V. V., Petrikov, V. D., Abroyan, I. A., Titov, A. I., Goncharuk, I. N., Smirnov, A. N., Mamutin, V. V., Ivanov, S. V., Inushima, T., Phys. Stat. Sol. B 216, 779 (1999)Google Scholar
[13] Lee, Ming-Chih, Lin, Heng-Ching, Pan, Yung-Chung, Shu, Chen-Ke, Jehn Ou, Wen-Hsiung Chen, and Chen, Wei-Kuo, Appl. Phys. Lett. 73, 2606 (1998)Google Scholar
[14] Dyck, J.S., Kash, K., Kim, K., Lambrecht, W.R.L., Hayman, C.C., Argoitia, A., Grossner, M.T., Zhou, W.L., and Angus, J.C., in Nitride Semiconductors, edited by DenBaars, S., Meyer, B., Nakamura, S., Ponce, F., and Strite, T, (Mater. Res. Soc. Proc. 482, Pittsburgh, PA, 1998), p.549.Google Scholar
[15] Yu, SeGi, Kim, K.W., Bergman, Leah, Dutta, Mitra, Stroscio, Michael, Zavada, John M., Phys. Rev. B 58, 15283 (1998)Google Scholar
[16] Grille, H., Schnittler, Ch., and Bechstedt, F., Phys. Rev. B 61, 6091 (2000)Google Scholar
[17] Behbehani, M.K., Piner, E.L., Liu, S.X., El-Masry, N.A., Bedair, S.M., Appl. Phys. Lett. 75, 2202 (1999)Google Scholar