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Understanding and Control of Lateral Contraction in Stamping Lithography

Published online by Cambridge University Press:  01 February 2011

Zheng Li ,
Li Tan  and
Gang-yu Liu
Zheng Li
Affiliation:
[email protected] UniversityDepartment of Mechanics and Engineering ScienceBeijing N/AChina, People's Republic of
Li Tan
Affiliation:
[email protected], University of Nebraska, Department of Engineering Mechanics and Nebraska Center for Materials and Nanoscience, Lincoln, NE, 68516, United States
Gang-yu Liu
Affiliation:
[email protected], University of California, Department of Chemistry, Davis, CA, 95616, United States
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Abstract

Thin film contraction under external mechanical stress can be used to miniaturize size and increase density of patterned features on top. Nonlinear Finite Element Analysis is used to provide guidance on this contraction process. It was found that the substrate contraction causes stress accumulation along interfaces between protruded features and substrate. These stress accumulation complexes the control of profile changes on patterned features and suggest a design of patterned features arranged beyond a critical distance to avoid cross-interference.

Keywords

simulationnanostructurepolymer
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 921: Symposium T – Nanomanufacturing , 2006 , 0921-T02-07
Copyright
Copyright © Materials Research Society 2006

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