No CrossRef data available.
Article contents
Understanding and Control of Lateral Contraction in Stamping Lithography
Published online by Cambridge University Press: 01 February 2011
Abstract
Thin film contraction under external mechanical stress can be used to miniaturize size and increase density of patterned features on top. Nonlinear Finite Element Analysis is used to provide guidance on this contraction process. It was found that the substrate contraction causes stress accumulation along interfaces between protruded features and substrate. These stress accumulation complexes the control of profile changes on patterned features and suggest a design of patterned features arranged beyond a critical distance to avoid cross-interference.
Keywords
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 921: Symposium T – Nanomanufacturing , 2006 , 0921-T02-07
- Copyright
- Copyright © Materials Research Society 2006