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SOI-Based Silicon Quantum Dots Contacted by Self-Aligned Nano-Electrodes

Published online by Cambridge University Press:  01 February 2011

Conrad R. Wolf ,
Andreas Ladenburger ,
Rainer Enchelmaier ,
Klaus Thonke  and
Rolf Sauer
Conrad R. Wolf
Affiliation:
[email protected], Ulm University, Institute for Semiconductor Physics, Albert-Einstein-Allee 45, Ulm, 89081, Germany
Andreas Ladenburger
Affiliation:
[email protected], Universität Ulm, Institut für Halbleiterphysik, Ulm, 89069, Germany
Rainer Enchelmaier
Affiliation:
[email protected], Universität Ulm, Institut für Halbleiterphysik, Ulm, 89069, Germany
Klaus Thonke
Affiliation:
[email protected], Universität Ulm, Institut für Halbleiterphysik, Ulm, 89069, Germany
Rolf Sauer
Affiliation:
[email protected], Universität Ulm, Institut für Halbleiterphysik, Ulm, 89069, Germany
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Abstract

In this paper we present a novel approach to fabricate single-electron devices utilizing different self-organization and self-alignment effects. Silicon quantum dots (QDs) are obtained employing reactive ion etching (RIE) into a silicon-on-insulator (SOI) substrate with a self-assembled etch mask. Electrodes with nanometer separation are fabricated and aligned to the QDs by means of a controlled electromigration process. The tunneling rates of the devices are defined by the native oxide covering the silicon QDs and can be adjusted by self-limiting thermal oxidation. The devices show clear Coulomb blockade behavior as well as Coulomb staircase features. In some samples also a gate influence is present giving rise to Coulomb diamonds in the differential conductance diagram.

Keywords

self-assemblyelectromigrationnanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 958: Symposium L – Group IV Semiconductor Nanostructures—2006 , 2006 , 0958-L10-21
Copyright
Copyright © Materials Research Society 2007

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References

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