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Silicon Microhotplate Arrays as a Platform for Efficient Gas Sensing Thin Film Research

Published online by Cambridge University Press:  15 February 2011

F. Dimeo Jr., ,
S. Semancik ,
R. E. Cavicchi ,
J. S. Suehle ,
N. H. Tea ,
M. D. Vaudin  and
J. T. Kelliher
F. Dimeo Jr.,
Affiliation:
Process Measurements Division, [email protected], [email protected]
S. Semancik
Affiliation:
Process Measurements Division, [email protected], [email protected]
R. E. Cavicchi
Affiliation:
Process Measurements Division, [email protected], [email protected]
J. S. Suehle
Affiliation:
Semiconductor Electronics Division
N. H. Tea
Affiliation:
Semiconductor Electronics Division
M. D. Vaudin
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD, 20899
J. T. Kelliher
Affiliation:
Microelectronics Research Laboratory, Columbia, MD 21045
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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 444: Symposium I – Materials for Mechanical and Optical Microsystems , 1996 , 203
Copyright
Copyright © Materials Research Society 1997

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References

1 P. Moseley, T., Stoneham, A. M., and Williams, D. E., “Chapter 4. Oxide Semiconductors: Pattern of Gas Response Behavior According to Material Type,” in Techniques and Mechanisms in Gas Sensing, edited by Moseley, P T, Norris, J., and Williams, D.E. (Adam Hilger, Bristol, 1991), pp. 108–138.Google Scholar
2 Taguchi, N., UK Patent No. 1280809 (1970).Google Scholar
3 Suehle, J. S., Cavicchi, R. E., Gaitan, M., and Semancik, S., IEEE Elec. Dev. Lett 14 (3), 118–120 (1993).Google Scholar
4 Semancik, S., Cavicchi, R. E., Gaitan, M., and Suehle, J. S., U.S. Patent No. 5345213 (1994).Google Scholar
5 F. DiMeo et al. to be published.Google Scholar
6 Disclaimer, Commercial Products are identified only to specify experimental procedure. This in no way implies recommendation or endorsement by the National Institute of Standards and Technology (1996).Google Scholar