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Self-assembled PS-PMMA nanodot array pattern arranged in a parallelogram guide
Published online by Cambridge University Press: 26 February 2011
Abstract
Mask patterns for XY-type magnetic patterned media using phase separation of polystyrene-polymethylmethacrylate (PS-PMMA) block copolymer were fabricated. Parallelogram guides molded by the nanoimprint lithography controlled the PS-PMMA self-assembling pattern that formed in the guide area. 45nm-pitch defect-free PS-PMMA dot patterns were obtained within a 1μm × 1μm area by optimizing the PS-PMMA film thickness.
Keywords
- Type
- Research Article
- Information
- MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Ra05-05-Rb05-05
- Copyright
- Copyright © Materials Research Society 2006