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Selective Area Deposition of Passivants, Insulators, and Epitaxial Films of II-VI Compound Semiconductors

Published online by Cambridge University Press:  21 February 2011

D.L. Dreifus
Affiliation:
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh NC 27695-7911
Y. Lansari
Affiliation:
Department of Physics, North Carolina State University, Raleigh NC 27695
J.W. Han
Affiliation:
Department of Physics, North Carolina State University, Raleigh NC 27695
S. Hwang
Affiliation:
Department of Physics, North Carolina State University, Raleigh NC 27695
J.W. Cook Jr.
Affiliation:
Department of Physics, North Carolina State University, Raleigh NC 27695
J.F. Schetzina
Affiliation:
Department of Physics, North Carolina State University, Raleigh NC 27695
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Abstract

II-VI semiconductor surface passivants, insulators, and epitaxial films have been deposited onto selective surface areas by employing a new masking and lift-off technique. The II-VI layers were grown by either conventional or photoassisted molecular beam epitaxy (MBE). CdTe has been selectively deposited onto HgCdTe epitaxial layers as a surface passivant. Selective-area deposition of ZnS has been used in metal-insulator-semiconductor (MIS) structures. Low resistance ohmic contacts to p-type CdTe:As have also been realized through the use of selectively-placed thin films of the semi-metal HgTe followed by a thermal evaporation of In. Epitaxial layers of HgTe, HgCdTe, and HgTe-CdTe superlattices have also been grown in selective areas on CdZnTe substrates, exhibiting specular morphologies and double-crystal x-ray diffraction rocking curves (DCXD) with full widths at half maximum (FWHMs) as narrow as 140 arcseconds.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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