Article contents
Pulsed Laser Annealing of Buried Damage in Ion Implanted Diamond
Published online by Cambridge University Press: 28 February 2011
Abstract
Damaged layers, buried underneath the surface of type IIa diamond slabs by 2.8 MeV C+ ion implantation have been subjected to irradiation with 14 ns pulses from a focused Nd-Glass laser. At high powers, ablation of the implanted surface was observed. However, the correct choice of laser power and wavelength results in annealing of the implanted layer without any disruption to the surface morphology. Annealing was confirmed by optical measurements showing a decrease in the GR-1 absorption band, and by channelled Rutherford Backscattering Spectroscopy on the small 10μm diameter laser irradiated spots. The results suggest that an undamaged diamond cap can be utilized to promote damage annealing of diamond by pulsed laser beams, for which the annealing in other materials has been shown to proceed via the melt. The surface cap is believed to aid in the production of extremely high internal pressures in the damaged layer during the laser pulse which prevents graphitization and promotes diamond regrowth.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1992
References
REFERENCES
- 1
- Cited by