Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-25T17:49:00.112Z Has data issue: false hasContentIssue false
  • English
  • Français

Properties of Ti1-xAlxN Deposited Using Dual Rotatable Magnetrons for Automotive Glass Privacy Coatings

Published online by Cambridge University Press:  21 February 2011

T. S. Morley ,
B. N. Vyletel ,
R. L. Crawley  and
K. E. Nietering
T. S. Morley
Affiliation:
Scientific Research Laboratories, Ford Motor Company, Mail Drop S3028, P. O. Box 2053, Dearborn, Michigan 48121–2053
B. N. Vyletel
Affiliation:
Scientific Research Laboratories, Ford Motor Company, Mail Drop S3028, P. O. Box 2053, Dearborn, Michigan 48121–2053
R. L. Crawley
Affiliation:
Research and Development Office, Glass Division, Ford Motor Company, 15000 Commerce Drive North, Dearborn, Michigan, 48120–1225
K. E. Nietering
Affiliation:
Research and Development Office, Glass Division, Ford Motor Company, 15000 Commerce Drive North, Dearborn, Michigan, 48120–1225
Get access

Abstract

Optically thin films of Ti1-xAlxN were sputter deposited using dual rotatable cathodes in nitrogen and argon-nitrogen environments. The sputtering parameters and film properties were analyzed to develop predictive techniques for possible feedback control during deposition. Also, it was found that feedback control during deposition was suitable for controlling film composition in some magnet configurations.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 356: Symposium B2 – Thin Films: Stresses and Mechanical Properties V , 1994 , 155
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Beck, U., Reiners, G., Urban, I., and Witt, K., Thin Solid Films, 220 (1992), 234.Google Scholar
2 Reiners, G., Hantsche, H., Jehn, H. A., Kopacz, U., and Rack, A., Surface and Coatings Technology, 54/55 (1992), 273.Google Scholar
3 Soriano, L., Abbate, M., Fuggle, J. C., Prieto, P., Jiménez, C., Sanz, J. M., Galán, L., and Hofmann, S., J. Vac. Sci. Technol. A 11 (1), 47, Jan/Feb 1993.Google Scholar
4 Mclntyre, D., Green, J. E., Håkansson, G. and Sundgren, J.-E., J. Appl. Phys. 67 (3), 1542, February 1, 1990 Google Scholar
5 Ichimura, H. and Kawana, A., J. Mater. Res., 8 (5), 1093, May 1993 Google Scholar
6 Münz, W.-D., J. Vac. Sci. Technol. A 4 (6), 2717, Nov/Dec 1986.Google Scholar
7 Knotek, O., Böhmer, M., and Leyendecker, T., J. Vac. Sci. Technol. A 4 (6), 2695, Nov/Dec 1986.Google Scholar
8 Jehn, H. A., Hofmann, S., and Rückborn, V.-E, J. Vac. Sci. Technol. A 4 (6), 2701, Nov/Dec 1986.Google Scholar
9 Randhawa, H., Surface and Coatings Technology, 36 (3–4), 829, Dec 15 1988 Google Scholar