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Partially Ionized Beam Deposition of Thin Films
Published online by Cambridge University Press: 21 February 2011
Abstract
It has been shown recently that using less than a few percent of self-ions, i.e., ions derived from the deposition material itself, (partially ionized beam (PIB) deposition), one can dramatically modify thin film properties. In this paper we discuss phenomena such as surface cleaning, enhanced surface ordering, and ion-induced surface damage associated with PIB-surface interactions. PIB metal deposition has been emphasized.
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- Copyright © Materials Research Society 1989
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