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Oxygen Precipitation and Thermal Donors in Silicon

Published online by Cambridge University Press:  28 February 2011

Ronald C. Newman*
Affiliation:
J. J. Thomson Physical Laboratory University of Reading, P. O. Box 220. Whiteknights, Reading, Berks, RG6 2AF, U.K.
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Abstract

Oxygen in silicon precipitates with second order kinetics at the normal diffusion rate at 450° C and there Is evidence for self-Interstitial generation. These findings are discussed In relation to thermal donors.

Type
Research Article
Copyright
Copyright © Materials Research Society 1986

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References

REFERENCES

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