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Optical Plasma Monitoring of Y-Ba-Cu-O Sputter Target Transients

Published online by Cambridge University Press:  21 February 2011

J. D. Klein  and
A. Yen
J. D. Klein
Affiliation:
EIC Laboratories, Norwood, MA 02062
A. Yen
Affiliation:
EIC Laboratories, Norwood, MA 02062
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Abstract

Plasma emission spectra resulting from rf sputtering Y-Ba-Cu-O targets were observed as a function of time using an optical multichannel analyser. Although most lines of the observed spectra are not attributable to target species, peaks associated with each cation element were resolved. The Ba and Cu peaks can be used as tracking indicators of process conditions. For example, switching from an O2/Ar sputter atmosphere to pure Ar enhanced the Ba peak more than those associated with CuO. The emission spectra from a newly fabricated target exhibited a first-order transient response in seeking equilibrium with the rf plasma. The transient response of a previously sputtered target is also first-order but with a shorter time constant.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 190: Symposium M – Plasma Processing and Synthesis of Materials III , 1990 , 335
Copyright
Copyright © Materials Research Society 1991

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References

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