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MW plasma enhanced CVD of intrinsic Si for thin film solar cells
Published online by Cambridge University Press: 01 February 2011
Abstract
Our aim is the development of high-throughput production technology for high efficiency, amorphous and microcrystalline thin film silicon photovoltaics (PV) on flexible substrates. A roll-to-roll system is developed, with three deposition chambers for the continuous deposition of n-type, intrinsic and p-type Si. Novel MW sources for plasma enhanced chemical vapour deposition (PECVD) are introduced in the roll-to-roll coater as MW-PECVD combines good quality with large area, high rate deposition of intrinsic Si. A comparison is made between Raman and UV-reflection spectroscopy.
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- Copyright © Materials Research Society 2008
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