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Multispectral Spectroscopic Ellipsometry-A New Tool for In Situ Surface Analysis
Published online by Cambridge University Press: 26 February 2011
Abstract
Spectroscopie ellipsometry is a non-destructive tool for physical characterization without prior preparation of materials.Real time, in-situ measurements can be applied to analyze surface problems, to optimize thin film processing and even to monitor epitaxial growth or thin film deposition. Spectroscopie Eilipsometers built by SOPRA are described. A new instrument using Optical Multi-channel Analysis,(OMA), with a spectral range from 1.1 ev up to 4.8 ev which gives up to 11 ellipsometry spectra per second has been developed. Applications using Spectroscopie Ellipsometry are also discussed .
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- Research Article
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- Copyright © Materials Research Society 1998
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