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Modification of Nanoporous Silica Structures by Fluorocarbon Plasma Treatment
Published online by Cambridge University Press: 17 March 2011
Abstract
Polymerization occurring during fluorocarbon plasma treatment as a potential method for pore sealing was investigated. CHF3 was used as a reactant gas to expedite the rate of polymerization due to the presence of hydrogen and the low C/F ratio. The reactor pressure was varied from 30mTorr to 90mTorr to change the number of neutrals that act as the polymerizing species. The films were exposed to the plasma for times of 1min, 3min, and 5 min to observe the penetration depth of neutrals and the thickness of modified layer as a function of time. Dielectric constants were measured before and after plasma treatment. The film morphology was investigated by scanning electron microscopy before and after plasma treatment and a featureless surface morphology was observed at 90mTorr on a 56% porosity film. After plasma treatment, the average pore neck size decreases which may help reduce metal precursor penetration during metallization.
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- Copyright © Materials Research Society 2004