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Microstructural Evolution and Stress Relaxation in Sputtered Tungsten Films
Published online by Cambridge University Press: 21 February 2011
Abstract
We have investigated the relationship between microstructure and stress in very thin sputtered W films. We discuss features of the microstructure, in particular the presence of voids in compressively stressed films, in terms of the evolution of the structure from a metastable β-phase. By developing a novel specimen geometry for the transmission electron microscope (TEM), we present dynamic observations of the β-W→α-W transformation.
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- Copyright © Materials Research Society 1994
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