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Micrometer-scale machining of metals and polymers enabled by focused ion beam sputtering

Published online by Cambridge University Press:  10 February 2011

D. P. Adams ,
G. L. Benavides  and
M. J. vasile
D. P. Adams
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185, [email protected]
G. L. Benavides
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185, [email protected]
M. J. vasile
Affiliation:
Louisiana Tech University, Ruston, LA 71272
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Abstract

This work combines focused ion beam sputtering and ultra-precision machining for microfabrication of metal alloys and polymers. Specifically, micro-end mills are made by Ga ion beam sputtering of a cylindrical tool shank. Using an ion energy of 20keV, the focused beam defines the tool cutting edges that have submicrometer radii of curvature. We demonstrate 25μm diameter micromilling tools having 2, 4 and 5 cutting edges. These tools fabricate fine channels, 26–28 microns wide, in 6061 aluminum, brass, and polymethyl methacrylate. Micro-tools are structurally robust and operate for more than 5 hours without fracture.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 546: Symposium AA – Materials Science of Microelectromechanical Systems (MEMS)… , 1998 , 201
Copyright
Copyright © Materials Research Society 1999

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References

[1] Orloff, J., Rev. Sci. Instrum. 64, 1105 (1993).Google Scholar
[2] Kirk, E.C.G., McMahon, R.A., Cleaver, J.R.A. and Ahmed, H., J. Vac. Sci. Technol. B 6, 1940 (1988).Google Scholar
[3] Albrecht, T. and Quate, C.F., J. Appl. Phys. 62, 2599 (1987).Google Scholar
[4] Vasile, M.J., Biddick, C.J. and Huggins, H., Appl. Phys. Lett. 64, 575 (1994).Google Scholar
[5] Vasile, M.J., Grigg, D.A., Griffith, J.E., Fitzgerald, E. and Russell, P.E., J. Vac. Sci. Technol. B 9, 3569 (1991).Google Scholar
[6] Russell, P.E., Stark, T.J., Griffis, D.P., Phillips, J.R. and Jarausch, K.F., J. Vac. Sci. Technol. B 16, 2494 (1998).Google Scholar
[7] Vasile, M.J., Biddick, C.J. and Schwalm, S.A., J. Vac. Sci. Technol. B 12, 2388 (1994). M.J. Vasile, C.R. Friedrich, B. Kikkeri, and R. McElhannon, Precision Engineering 19, 180 (1996).Google Scholar
[8] Ishitani, T., Ohnishi, T. and Kawanami, Y., Jap. J. Appl. Phys. 29, 2283 (1990).Google Scholar
[9] Harriott, L.R., Proc. SPIE Int. Soc. Eng., 773, 190 (1987).Google Scholar
[10] Friedrich, C.R. and Vasile, M.J., J. MEMS 5, 33 (1996).Google Scholar
[11] Vasile, M.J., Nassar, R., Niu, Z., Zhang, W. and Liu, S., J. Vac. Sci. Technol. B 15, 2350 (1997).Google Scholar
[12] Thaus, D.M., Stark, T.J., Griffis, D.P. and Russell, P.E., J. Vac. Sci. Technol. B 14, 3928 (1996).Google Scholar