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Mesoporous Silica Film Preparation by Novel Supercritical Fluid Extraction of Organic Templates

Published online by Cambridge University Press:  01 February 2011

Nobuyuki Kawakami ,
Takayuki Hirano ,
Yoshito Fukumoto  and
Yoshiyuki Nagase
Nobuyuki Kawakami
Affiliation:
Electronics Research Lab., Kobe Steel, Ltd., Kobe, JAPAN
Takayuki Hirano
Affiliation:
Electronics Research Lab., Kobe Steel, Ltd., Kobe, JAPAN
Yoshito Fukumoto
Affiliation:
Electronics Research Lab., Kobe Steel, Ltd., Kobe, JAPAN
Yoshiyuki Nagase
Affiliation:
Chemical & Environmental Technology Lab., Kobe Steel, Ltd., Kobe, JAPAN.
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Abstract

Supercritical fluid extraction (SFE) technique which enables to fabricate mesoporous film at low temperature has been developed. Meso-structure silica films are prepared by sol-gel process based on the self-organization of surfactant templates, and the organic templates are successfully extracted from the films by supercritical CO2 (sc-CO2) modified with hydrogen peroxide at 80 °C and 19.6 MPa. The extraction process is analyzed by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy of the films. In order to discuss the feasibility of such films obtained at low temperature for electronics applications with low dielectric and low dielectric loss, the mechanical properties and the densities of the films are compared with various silica films prepared by different method.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 788: Symposium L – Continuous Nanophase and Nanostructured Materials , 2003 , L8.25
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

1. Oku, Y., Nishiyama, N., Tanaka, S., Ueyama, K., Hata, N. and Kikkawa, T. in Silicon Materials Processing-Characterization and Reliability, edited by Veteran, J., O'Meara, D. L., Misra, V. and Ho, P., (Mater. Res. Soc. Proc. 716, 2002) pp. 587–592.Google Scholar
2. Berquier, J. M., Nael, P., Jupille, J. and Jacquiod, C., J. Sol-Gel. Sci. Technol. 19, 83 (2000).Google Scholar
3. Balkenende, A. R., de Theije, F. K. and Kriege, J. C. K., Adv. Mater. 15, 139 (2003).Google Scholar
4. Ogawa, M., Chem. Commun. 1149 (1996).Google Scholar
5. Ko, C. H., Kim, J. M. and Ryoo, R., Microporous and Mesoporous Mater. 21, 235 (1998).Google Scholar
6. Paik, J. A., Fan, S. K., Kim, C. J., Wu, M. C. and Dunn, B., J. Mater. Res. 17, 2121 (2002).Google Scholar
7. Kawi, S. and Lai, M. W., AIChE Journal, 48, 1572 (2002).Google Scholar
8. Rajagopalan, T., Lahlouh, B., Lubguban, J. A., Biswas, N., Gangopadhyay, S., Sun, J., Huan, D. H., Simon, S. L., Mallikarjunan, A., Kim, H. C., Volksen, W., Toney, M. F., Huang, E., Rice, P. M., Delenia, E. and Miller, R. D., Appl. Phys. Lett. 82, 4328 (2003).Google Scholar
9. Chatterjee, M., Hayashi, H. and Saito, N., Microporous and Mesoporous Mater. 57, 143 (2003).Google Scholar