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MBE Growth of GaN using NH3 and Plasma Sources

Published online by Cambridge University Press:  17 March 2011

A.V. Sampath
Affiliation:
Electrical and Computer Engineering, Photonics Center, Boston University8. St. Mary's St., Boston, MA 02215
A. Bhattacharyya
Affiliation:
Electrical and Computer Engineering, Photonics Center, Boston University8. St. Mary's St., Boston, MA 02215
I. Sandeep
Affiliation:
Electrical and Computer Engineering, Photonics Center, Boston University8. St. Mary's St., Boston, MA 02215
H.M. Ng
Affiliation:
Electrical and Computer Engineering, Photonics Center, Boston University8. St. Mary's St., Boston, MA 02215
E. Iliopoulos
Affiliation:
Electrical and Computer Engineering, Photonics Center, Boston University8. St. Mary's St., Boston, MA 02215
T.D. Moustakas
Affiliation:
Electrical and Computer Engineering, Photonics Center, Boston University8. St. Mary's St., Boston, MA 02215
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Abstract

We report on a comparative study of the growth of GaN in an arsenic free MBE system using either the method of plasma activation of molecular nitrogen or catalytic decomposition of ammonia on a heated substrate. We find that while growth with a plasma source leads to smooth films only under Ga- rich conditions, growth with ammonia leads to smooth films under ammonia-rich conditions. In both cases we find a 2×2 surface reconstruction when using an AlN buffer, which is evidence that material grown with this buffer layer has the Ga-polarity. In the case of plasma growth we also investigated the use of a GaNbuffer and found that at the growth temperature the surface is unreconstructed, however it undergoes 3×3 reconstruction upon cooling to 300 °C. This observation is evidence that material grown on a GaN buffer has the N-polarity.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

[1] Gallium Nitride (GaN) I, in Semiconductors and Semimetals, edited by Pankove, J.I. and Moustakas, T.D. (Academic Press, San Diego, 1998) Vol. 50 Google Scholar
[2] Gallium Nitride (GaN) II, in Semiconductors and Semimetals, edited by Pankove, J.I. and Moustakas, T.D. (Academic Press, San Diego, 1999) Vol. 57 Google Scholar
[3] Moustakas, T.D., in Ref. 2 (Chapter 2)Google Scholar
[4] Liu, S.S. and Stevenson, D.A., J. Electrochem. Soc. 125, 1161 (1978)Google Scholar
[5] Yang, Z., Li, L.K., and Wang, W.I, Appl. Phys. Lett. 67, 1686 (1995)Google Scholar
[6] Moustakas, T.D. and Molnar, R.J., Mat. Res Soc. Symp. Proc. 281, 753 (1993)Google Scholar
[7] Grandjean, N., Leroux, M., Massies, J., Mesrine, M. and Laugt, M., Jpn. J. Appl. Phys. 38, 618 (1999)Google Scholar
[8] Held, R., Ishaug, B. E., Parkhomovsky, A., Dabiran, A. M., and Cohen, P. I., J. Appl. Phys. 85, 7697 (1999)Google Scholar
[9] Smith, A.R., Feenstra, R.M., Greve, D.W., Shin, M.S., Skowroski, M., Neugubauer, J. and Northrup, J.E, Appl. Phys. Lett. 72, 2114 (1998)Google Scholar
[10] Seelman-Eggbert, M., Weyher, J.L., Obloh, H., Zimmermann, H., Rar, A. and Porowski, S., Appl. Phys. Lett. 71, 2635 (1997)Google Scholar
[11] Ramachandran, V., Lee, C.D., Feenstra, R.M., Smith, A.R., Northrup, J.E., Greve, D.W., Jour. Crys. Growth 209, 355 (2000)Google Scholar