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A Mass Spectrometric System for the Study of Transient Plasma Species in Thin Film Deposition

Published online by Cambridge University Press:  15 February 2011

N.P. Johnson ,
A.P. Webb  and
D.J. Fabian
N.P. Johnson
Affiliation:
Department of Metallurgy and Materials, University of Strathclyde, Glasgow Gl IXN, Scotland
A.P. Webb
Affiliation:
Department of Electronics and Electrical Engineering, University of Glasgow, Glasgow, Scotland
D.J. Fabian
Affiliation:
Department of Physics, Simon Fraser University, Burnaby, B.C. Canada, On leave from University of Strathclyde, Glasgow, Scotland
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Abstract

A system is described for mass spectrometric detection of transient gaseous species involved in reactive plasma deposition of materials. The equipment comprises a three stage differentially pumped UHV quadrupole mass spectrometer chamber, which permits modulated molecular beam sampling over a short path-length, direct from the plasma at 0.1–1.0 torr pressure. Operation of the system and optimum conditions for maximum signal-detection are detailed, and preliminary results for species formed in a silane-argon high-power rf discharge are reported. Spectra mostly agree with those obtained by Turban and Catherine using a lower power rf plasma, although some evidence is observed for the formation of increased SiH species at higher power.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 30: Symposium L – Plasma Processing and Synthesis of Materials I , 1983 , 277
Copyright
Copyright © Materials Research Society 1984

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References

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